Electron Beam Evaporation or (EB) evaporation

by:ambitionmods     2020-07-18
Electron Beam (eb) evaporation coatings process falls into a larger category of process known as Physical Vapor Deposition (PVD). Deposition processes are used to release a material from a source and transfer that material to a substrate, forming a thin film coating. PVD processes are commonly used for the deposition of metals; because they can be performed at lower process risk and cheaper in regards to materials cost than Chemical Vapor Deposition (CVD). The electron beam (eb) evaporation coatings process typically involves the following components: Thin film deposition is a process carried out in optics industries to impart the desired reflective properties while, in the aerospace industry to form thermal and chemical barrier coatings to protect the surfaces against corrosive environments, in semiconductor industry to grow electronic materials and elsewhere in industry to modify surfaces to have a variety of shapes. Deposition process can be broadly classified into physical vapor deposition (PVD) and chemical vapor deposition (CVD). When the vapor source is from a liquid or solid material the process is called physical vapor deposition (PVD). When the source is from a chemical vapor the process is called low pressure chemical vapor deposition or, if in a plasma, plasma enhanced CVD or 'plasma assisted CVD'. Often a combination of PVD and CVD processes are used in the same or connected processing chambers. Electron beam evaporation is a commonly used process for coating lenses and filters with anti-reflection, scratch-resistant or other specialized coatings. The process is also commonly used for coating insulating and resistor films on electronic components. Electron beam physical vapor deposition yields a high deposition at relatively low substrate temperatures, with very high material utilization efficiency. The material utilization efficiency is high relative due to other methods and the process, which offers structural and morphological control of films. Due to the very high deposition rate, this process has potential industrial application for wear resistant and thermal barrier coatings in aerospace industries, hard coatings for cutting and tool industries, and electronic and optical films for semiconductor industries. There are various methods used for Thin Film Coatings, which includes the following: Electron Beam Evaporation, Thermal Evaporation, Ion-Beam Sputtering and Magnetron Sputtering. There are various industries, which offers a wide variety of vacuum deposited thin films for the medical, telecommunications, industrial, military, aerospace, and fiber-optic markets.
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